Publication Information

Title:
Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
Type:
Journal
Info:
Journal of Crystal Growth 455 (2016) 157 - 160
Date:
2016-10-11

Author Information

Name Institution
V. A. TaralaNorth-Caucasus Federal University
M. AmbartsumovNorth-Caucasus Federal University
A. S. AltakhovNorth-Caucasus Federal University
V. Ya. MartensNorth-Caucasus Federal University
M. Yu. ShevchenkoNorth-Caucasus Federal University

Films

Plasma AlN


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Substrates

Si(100)
Si(111)
Sapphire

Keywords

Notes

940