Publication Information

Title:
Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 01A114 (2016)
Date:
2015-10-19

Author Information

Name Institution
Lukas HoffmannUniversity of Wuppertal
Detlef TheirichUniversity of Wuppertal
Tim HasselmannUniversity of Wuppertal
André RäupkeUniversity of Wuppertal
Daniel SchlammUniversity of Wuppertal
Thomas RiedlUniversity of Wuppertal

Films

Plasma Al2O3


Thermal Al2O3

Hardware used: Beneq TFS-200


Thermal TiO2

Hardware used: Beneq TFS-200


Film/Plasma Properties

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test

Characteristic: Thickness
Analysis: Profilometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Substrates

Silicon
ITO

Keywords

Notes

405