Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures

Type:
Journal
Info:
physica status solidi (RRL) - Rapid Research Letters Volume 12, Issue 3, pages 1700430
Date:
2017-12-28

Author Information

Name Institution
AnYao LiuThe Australian National University
Daniel MacdonaldThe Australian National University

Films

Plasma Al2O3


Film/Plasma Properties

Substrates

Silicon

Keywords

Notes

1090