Publication Information

Title: Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures

Type: Journal

Info: physica status solidi (RRL) - Rapid Research Letters Volume 12, Issue 3, pages 1700430

Date: 2017-12-28

DOI: http://dx.doi.org/10.1002/pssr.201700430

Author Information

Name

Institution

The Australian National University

The Australian National University

Films

Plasma Al2O3 using Beneq TFS-200

Deposition Temperature = 175C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Silicon

Keywords

Notes

1090



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