A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition

Type:
Journal
Info:
APL Mater. 8, 071101 (2020)
Date:
2020-06-15

Author Information

Name Institution
Tuan Anh NguyenLuxembourg Institute of Science and Technology
Noureddine AdjeroudLuxembourg Institute of Science and Technology
Sebastjan GlinsekLuxembourg Institute of Science and Technology
Yves FlemingLuxembourg Institute of Science and Technology
Jérôme GuillotLuxembourg Institute of Science and Technology
Patrick GrysanLuxembourg Institute of Science and Technology
Jérôme Polesel-MarisLuxembourg Institute of Science and Technology

Films

Plasma AlN


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Microstructure
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Piezoelectric properties
Analysis: Custom

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: X-ray Pole Figure

Substrates

Si(100)
Ni

Keywords

Notes

1497