A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
APL Mater. 8, 071101 (2020)
Date:
2020-06-15
Author Information
Name | Institution |
---|---|
Tuan Anh Nguyen | Luxembourg Institute of Science and Technology |
Noureddine Adjeroud | Luxembourg Institute of Science and Technology |
Sebastjan Glinsek | Luxembourg Institute of Science and Technology |
Yves Fleming | Luxembourg Institute of Science and Technology |
Jérôme Guillot | Luxembourg Institute of Science and Technology |
Patrick Grysan | Luxembourg Institute of Science and Technology |
Jérôme Polesel-Maris | Luxembourg Institute of Science and Technology |
Films
Plasma AlN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Microstructure
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Piezoelectric properties
Analysis: Custom
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: X-ray Pole Figure
Substrates
Si(100) |
Ni |
Notes
1497 |