
Low temperature temporal and spatial atomic layer deposition of TiO2 films
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 33, 041512 (2015)
Date:
2015-06-01
Author Information
Name | Institution |
---|---|
Morteza Aghaee | Lappeenranta University of Technology |
Philipp S. Maydannik | Lappeenranta University of Technology |
Petri Johansson | Tampere University of Technology |
Jurkka Kuusipalo | Tampere University of Technology |
Mariadriana Creatore | Eindhoven University of Technology |
Tomáš Homola | Masaryk University |
David C. Cameron | Masaryk University |
Films
Thermal TiO2
Thermal TiO2
Plasma TiO2
Thermal TiO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: -
Substrates
PEN, Polyethylene Napthalate |
Si(100) |
Notes
370 |