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Publication Information

Title: Low temperature temporal and spatial atomic layer deposition of TiO2 films

Type: Journal

Info: Journal of Vacuum Science & Technology A 33, 041512 (2015)

Date: 2015-06-01

DOI: http://dx.doi.org/10.1116/1.4922588

Author Information

Name

Institution

Lappeenranta University of Technology

Lappeenranta University of Technology

Tampere University of Technology

Tampere University of Technology

Eindhoven University of Technology

Masaryk University

Masaryk University

Films

Thermal TiO2 using Beneq TFS-200

Deposition Temperature Range = 80-120C

546-68-9

7732-18-5

Thermal TiO2 using Beneq TFS-200

Deposition Temperature Range = 80-120C

546-68-9

10028-15-6

Plasma TiO2 using Beneq TFS-200

Deposition Temperature = 80C

546-68-9

7782-44-7

Thermal TiO2 using Beneq TFS-200R

Deposition Temperature Range = 80-120C

546-68-9

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000U

Refractive Index

Ellipsometry

J.A. Woollam M-2000U

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Water Vapor Transmission Rate (WVTR)

Unknown

Mocon Aquatron Model 1

Substrates

PEN, Polyethylene Napthalate

Si(100)

Keywords

Notes

370


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