Publication Information

Title:
Low temperature temporal and spatial atomic layer deposition of TiO2 films
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 33, 041512 (2015)
Date:
2015-06-01

Author Information

Name Institution
Morteza AghaeeLappeenranta University of Technology
Philipp S. MaydannikLappeenranta University of Technology
Petri JohanssonTampere University of Technology
Jurkka KuusipaloTampere University of Technology
Mariadriana CreatoreEindhoven University of Technology
Tomáš HomolaMasaryk University
David C. CameronMasaryk University

Films

Thermal TiO2


Thermal TiO2


Plasma TiO2


Thermal TiO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: -

Substrates

PEN, Polyethylene Napthalate
Si(100)

Keywords

Notes

370