Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing

Type:
Journal
Info:
Acta Materialia 127 (2017) 108 - 116
Date:
2017-01-08
DOI:
https://doi.org/10.1016/j.actamat.2017.01.014

Author Information

Name Institution
Anna KosinovaTechnion-Israel Institute of Technology
Dong WangIlmenau University of Technology
Eszter BaradácsUniversity of Debrecen
Bence ParditkaUniversity of Debrecen
Thomas KupsIlmenau University of Technology
Leonid KlingerTechnion-Israel Institute of Technology
Zoltán ErdélyiUniversity of Debrecen
Peter SchaafIlmenau University of Technology
Eugen RabkinTechnion-Israel Institute of Technology

Films

Plasma Al2O3

Hardware used: Beneq TFS-200
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 150C

Film/Plasma Properties

Substrates

Au

Notes

1041