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Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
Type:
Journal
Info:
ACS Omega 2017, 2, 1259-1264
Date:
2017-03-09
Author Information
| Name | Institution |
|---|---|
| Yoonseok Park | American Society for Engineering Education |
| Thomas Larrabee | U.S. Naval Research Laboratory |
| Laura B. Ruppalt | U.S. Naval Research Laboratory |
| Daniel Czurratis | U.S. Naval Research Laboratory |
| Sharka M. Prokes | U.S. Naval Research Laboratory |
Films
Other VOx
Thermal VOx
Film/Plasma Properties
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| Si(100) |
| SiO2 |
Notes
| 1040 |