Publication Information

Title:
Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
Type:
Journal
Info:
ACS Omega 2017, 2, 1259-1264
Date:
2017-03-09

Author Information

Name Institution
Yoonseok ParkAmerican Society for Engineering Education
Thomas LarrabeeU.S. Naval Research Laboratory
Laura B. RuppaltU.S. Naval Research Laboratory
Daniel CzurratisU.S. Naval Research Laboratory
Sharka M. ProkesU.S. Naval Research Laboratory

Films



Film/Plasma Properties

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Si(100)
SiO2

Keywords

Notes

1040