TEMAV, (EtMeN)4V, [(C2H5)(CH3)N]4V, Tetrakis(EthylMethylAmido) Vanadium, Vanadium Ethylmethylamide, CAS# 791114-66-4

Where to buy

1Strem Chemicals, Inc.Tetrakis(ethylmethylamino)vanadium(IV), 98% TEMAV

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
2Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
3Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material