The publication database currently has 1562 entries.
Search from:
194 Films Compositions
265 Precursors and Plasma Gases
75 Deposition Hardwares
242 Film and Plasma Characteristics
83 Theses
Use Multifactor Search for more complex searches and for searching by other criteria (author, affiliation, analysis, deposition temperature)
ALD Links
Contact Us
Advertising
Search 1562 plasma ALD publications by:
Search 1562 plasma ALD publications by:
Where to buy TEMAV, (EtMeN)4V, [(C2H5)(CH3)N]4V, Tetrakis(EthylMethylAmido) Vanadium, Vanadium Ethylmethylamide
TEMAV, (EtMeN)4V, [(C2H5)(CH3)N]4V, Tetrakis(EthylMethylAmido) Vanadium, Vanadium Ethylmethylamide is available from the following source(s):
| Number | Vendor | Link |
|---|---|---|
| 1 | Strem Chemicals, Inc. | Tetrakis(ethylmethylamino)vanadium(IV), 98% TEMAV |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |