2021 Year in Review
The publication database currently has 1628 entries.
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203 Films Compositions
272 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics
90 Theses
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Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
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Where to buy TEMAV, (EtMeN)4V, [(C2H5)(CH3)N]4V, Tetrakis(EthylMethylAmido) Vanadium, Vanadium Ethylmethylamide
TEMAV, (EtMeN)4V, [(C2H5)(CH3)N]4V, Tetrakis(EthylMethylAmido) Vanadium, Vanadium Ethylmethylamide is available from the following source(s):
| Number | Vendor | Link |
|---|---|---|
| 1 | Strem Chemicals, Inc. | Tetrakis(ethylmethylamino)vanadium(IV), 98% TEMAV |
If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.