Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy TEMAV, (EtMeN)4V, [(C2H5)(CH3)N]4V, Tetrakis(EthylMethylAmido) Vanadium, Vanadium Ethylmethylamide CAS# 791114-66-4

TEMAV, (EtMeN)4V, [(C2H5)(CH3)N]4V, Tetrakis(EthylMethylAmido) Vanadium, Vanadium Ethylmethylamide CAS# 791114-66-4 is available from the following source(s):

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸Tetrakis(ethylmethylamino)vanadium(IV), 98% TEMAV

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.