Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
Type:
Journal
Info:
J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015
Date:
2014-12-08
Author Information
| Name | Institution |
|---|---|
| Alexander Sasinska | University of Cologne |
| Trilok Singh | University of Cologne |
| Shuangzhou Wang | University of Cologne |
| Sanjay Mathur | University of Cologne |
| Ralph Kraehnert | Technische Universität Berlin |
Films
Thermal TiO2
Other TiO2
Film/Plasma Properties
Characteristic: Photoelectrochemical (PEC) Activity
Analysis: Linear Sweep Voltammetry
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Photocurrent
Analysis: Photocurrent Measurements
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Two-point Probe
Characteristic: Unknown
Analysis: Raman Spectroscopy
Characteristic: Optical Bandgap
Analysis: -
Substrates
| FTO, F:SnO2 |
Notes
| Impact of H2 plasma treatment of Beneq TFS 200 thermal ALD TiO2 for photoelectrochemical water splitting. |
| Beneq TFS-200 used for thermal ALD of TiO2. H2 plasma exposure done on different, unspecified hardware. |
| 173 |