Publication Information

Title:
Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
Type:
Journal
Info:
J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015
Date:
2014-12-08

Author Information

Name Institution
Alexander SasinskaUniversity of Cologne
Trilok SinghUniversity of Cologne
Shuangzhou WangUniversity of Cologne
Sanjay MathurUniversity of Cologne
Ralph KraehnertTechnische Universit├Ąt Berlin

Films

Thermal TiO2


Other TiO2


Film/Plasma Properties

Characteristic: Photoelectrochemical (PEC) Activity
Analysis: Linear Sweep Voltammetry

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Photocurrent
Analysis: Photocurrent Measurements

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Two-point Probe

Characteristic: Unknown
Analysis: Raman Spectroscopy

Characteristic: Optical Bandgap
Analysis: -

Substrates

FTO, F:SnO2

Keywords

Photoelectrochemical (PEC) water splitting

Notes

Impact of H2 plasma treatment of Beneq TFS 200 thermal ALD TiO2 for photoelectrochemical water splitting.
Beneq TFS-200 used for thermal ALD of TiO2. H2 plasma exposure done on different, unspecified hardware.
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