Title: Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
Type: Journal
Info: J. Vac. Sci. Technol. A 30(1), Jan/Feb 2012
Date: 2011-11-20
DOI: http://dx.doi.org/10.1116/1.3670876
Name
Institution
Infineon Technologies AG
Infineon Technologies AG
R3T GmbH
Characteristic
Analysis
Diagnostic
Compositional Depth Profiling
AES, Auger Electron Spectroscopy
Unknown
Leakage Current
I-V, Current-Voltage Measurements
Unknown
Crystallinity, Crystal Structure, Grain Size, Atomic Structure
XRD, X-Ray Diffraction
Unknown
Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Anneal
Unknown
Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Raman Spectroscopy
Unknown
Silicon
TaN
TiN
W
High-k Dielectric Thin Films
196
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