Name

Institution

Wolfgang Lehnert

Infineon Technologies AG

Guenther Ruhl

Infineon Technologies AG

Alexander Gschwandtner

R3T GmbH

Thermal TiO₂ using ASM A400

Deposition Temperature Range = 150-240C

TTIP, Titanium(IV) i-propoxide

546-68-9

Where to buy precursor

Water, H₂O

7732-18-5

Thermal TiO₂ using ASM A400

Deposition Temperature Range = 150-240C

TTIP, Titanium(IV) i-propoxide

546-68-9

Where to buy precursor

Ozone, O₃

10028-15-6

Plasma TiO₂ using ASM A400

Deposition Temperature Range = 150-240C

TTIP, Titanium(IV) i-propoxide

546-68-9

Where to buy precursor

Oxygen, O₂

7782-44-7

Thermal TiO₂ using ASM A400

Deposition Temperature Range = 150-240C

Titanium tert-butoxide, Ti(O^tBu)₄

3087-39-6

Where to buy precursor

Water, H₂O

7732-18-5

Thermal TiO₂ using ASM A400

Deposition Temperature Range = 150-240C

Titanium tert-butoxide, Ti(O^tBu)₄

3087-39-6

Where to buy precursor

Ozone, O₃

10028-15-6

Plasma TiO₂ using ASM A400

Deposition Temperature Range = 150-240C

Titanium tert-butoxide, Ti(O^tBu)₄

3087-39-6

Where to buy precursor

Oxygen, O₂

7782-44-7

Thermal TiO₂ using ASM A400

Deposition Temperature Range = 150-240C

TDMAT, Tetrakis[(DiMethyl)Amido]Titanium, [Me₂N]₄Ti

3275-24-9

Where to buy precursor

Water, H₂O

7732-18-5

Thermal TiO₂ using ASM A400

Deposition Temperature Range = 150-240C

TDMAT, Tetrakis[(DiMethyl)Amido]Titanium, [Me₂N]₄Ti

3275-24-9

Where to buy precursor

Ozone, O₃

10028-15-6

Plasma TiO₂ using ASM A400

Deposition Temperature Range = 150-240C

TDMAT, Tetrakis[(DiMethyl)Amido]Titanium, [Me₂N]₄Ti

3275-24-9

Where to buy precursor

Oxygen, O₂

7782-44-7

Thermal TiO₂ using ASM A400

Deposition Temperature Range = 150-240C

Titanium ethoxide, Ti(OEt)₄

3087-36-3

Where to buy precursor

Water, H₂O

7732-18-5

Thermal TiO₂ using ASM A400

Deposition Temperature Range = 150-240C

Titanium ethoxide, Ti(OEt)₄

3087-36-3

Where to buy precursor

Ozone, O₃

10028-15-6

Plasma TiO₂ using ASM A400

Deposition Temperature Range = 150-240C

Titanium ethoxide, Ti(OEt)₄

3087-36-3

Where to buy precursor

Oxygen, O₂

7782-44-7

Thermal Al₂O₃ using ASM A400

Deposition Temperature Range = 150-240C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH₃)₃, AlMe₃, Al₂(CH₃)₆, Al₂Me₆

75-24-1

Where to buy precursor

Water, H₂O

7732-18-5

Plasma AlTi_xO_y using ASM A400

Deposition Temperature Range = 150-240C

TDMAT, Tetrakis[(DiMethyl)Amido]Titanium, [Me₂N]₄Ti

3275-24-9

Where to buy precursor

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH₃)₃, AlMe₃, Al₂(CH₃)₆, Al₂Me₆

75-24-1

Where to buy precursor

Oxygen, O₂

7782-44-7

Characteristic

Analysis

Diagnostic

Compositional Depth Profiling

AES, Auger Electron Spectroscopy

Unknown

Leakage Current

I-V, Current-Voltage Measurements

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Anneal

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Raman Spectroscopy

Unknown

Silicon

TaN

TiN

W

High-k Dielectric Thin Films

196