Publication Information

Title:
Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
Type:
Journal
Info:
Langmuir, 2012, 28 (1), pp 350-357
Date:
2011-10-24

Author Information

Name Institution
Vikrant R. RaiColorado School of Mines
Vincent VandalonEindhoven University of Technology
Sumit AgarwalColorado School of Mines

Films

Plasma Al2O3


Thermal Al2O3


Film/Plasma Properties

Characteristic: Surface Reactions
Analysis: ATR-FTIR

Characteristic: Thickness
Analysis: Ellipsometry

Substrates

Silicon
Al2O3

Keywords

Plasma vs Thermal Comparison

Notes

1445