Search 1528 plasma ALD publications by:
Search 1528 plasma ALD publications by:
Publication Information
Title:
Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
Type:
Journal
Info:
Langmuir, 2012, 28 (1), pp 350-357
Date:
2011-10-24
Author Information
Name | Institution |
---|---|
Vikrant R. Rai | Colorado School of Mines |
Vincent Vandalon | Eindhoven University of Technology |
Sumit Agarwal | Colorado School of Mines |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Surface Reactions
Analysis: ATR-FTIR
Characteristic: Thickness
Analysis: Ellipsometry
Substrates
Silicon |
Al2O3 |
Keywords
Plasma vs Thermal Comparison |
Notes
1445 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |