Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone

Type:
Journal
Info:
Langmuir, 2012, 28 (1), pp 350-357
Date:
2011-10-24
DOI:
http://dx.doi.org/10.1021/la201136k

Author Information

Name Institution
Vikrant R. RaiColorado School of Mines
Vincent VandalonEindhoven University of Technology
Sumit AgarwalColorado School of Mines

Films

Plasma Al2O3

Hardware used: Custom Remote Inductively Coupled Plasma
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 70-200C

Thermal Al2O3

Hardware used: Custom
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O3, Ozone
CAS#: 10028-15-6
Deposition Temperature Range = 70-200C

Film/Plasma Properties

Characteristic: Surface Reactions
Analysis: ATR-FTIR
Diagnostic: Nicolet 6700

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-44

Substrates

Silicon
Al2O3

Notes

1445