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Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
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Publication Information
Title:
Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
Type:
Journal
Info:
Langmuir, 2012, 28 (1), pp 350-357
Date:
2011-10-24
Author Information
| Name | Institution |
|---|---|
| Vikrant R. Rai | Colorado School of Mines |
| Vincent Vandalon | Eindhoven University of Technology |
| Sumit Agarwal | Colorado School of Mines |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Surface Reactions
Analysis: ATR-FTIR
Characteristic: Thickness
Analysis: Ellipsometry
Substrates
| Silicon |
| Al2O3 |
Keywords
| Plasma vs Thermal Comparison |
Notes
| 1445 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
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