Publication Information

Title: Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma

Type: Presentation

Info: ALD 2009

Date: 2009-07-20

DOI: No DOI

Author Information

Name

Institution

Air Products

Air Products

Air Products

Air Products

Films

Plasma SiO2 using Quros 100

Deposition Temperature Range N/A

186598-40-3

7782-44-7

Thermal SiO2 using Quros 100

Deposition Temperature Range N/A

186598-40-3

10028-15-6

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

-

Thickness

Ellipsometry

-

Thickness

SEM, Scanning Electron Microscopy

-

Substrates

Unknown

Keywords

Dielectric Thin Films

Notes

Presentation contains physical characteristics data. Probably same dataset as is in Air Products datasheet.

74



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