Publication Information

Title: Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma

Type: Presentation

Info: ALD 2009

Date: 2009-07-20

DOI: No DOI

Author Information

Name

Institution

Air Products

Air Products

Air Products

Air Products

Films

Plasma SiO2 using Quros 100

Deposition Temperature Range N/A

186598-40-3

7782-44-7

Thermal SiO2 using Quros 100

Deposition Temperature Range N/A

186598-40-3

10028-15-6

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Thickness

Ellipsometry

Unknown

Thickness

SEM, Scanning Electron Microscopy

Unknown

Substrates

Unknown

Keywords

Dielectric Thin Films

Notes

Presentation contains physical characteristics data. Probably same dataset as is in Air Products datasheet.

74



Shortcuts



© 2014-2018 plasma-ald.com