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Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
Type:
Presentation
Info:
ALD 2009
Date:
2009-07-20
DOI:
No DOI
Author Information
| Name | Institution |
|---|---|
| Sung-Sil Cho | Air Products |
| Moo-Sung Kim | Air Products |
| Sang-Hyun Yang | Air Products |
| Xinjian Lei | Air Products |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Substrates
| Unknown |
Notes
| Presentation contains physical characteristics data. Probably same dataset as is in Air Products datasheet. |
| 74 |