Publication Information

Title:
Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
Type:
Presentation
Info:
ALD 2009
Date:
2009-07-20
DOI:
No DOI

Author Information

Name Institution
Sung-Sil ChoAir Products
Moo-Sung KimAir Products
Sang-Hyun YangAir Products
Xinjian LeiAir Products

Films

Plasma SiO2


Thermal SiO2


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Substrates

Unknown

Keywords

Dielectric Thin Films

Notes

Presentation contains physical characteristics data. Probably same dataset as is in Air Products datasheet.
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