Title: Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
Type: Journal
Info: Chem. Mater., 2015, 27 (10), pp 3628-3635
Date: 2015-05-05
DOI: http://dx.doi.org/10.1021/acs.chemmater.5b00255
Name
Institution
Ghent University
Ghent University
Ghent University
Ghent University
Characteristic
Analysis
Diagnostic
Thickness
Ellipsometry
J.A. Woollam M-2000
Thickness
XRR, X-Ray Reflectivity
Bruker D8 Discover
Crystallinity, Crystal Structure, Grain Size, Atomic Structure
XRD, X-Ray Diffraction
Bruker D8 Discover
Chemical Composition, Impurities
XPS, X-ray Photoelectron Spectroscopy
-
Morphology, Roughness, Topography
AFM, Atomic Force Microscopy
Bruker Dimension Edge
Electrochemical Performance
Galvanostatic Cycling
Metrohm Autolab PGSTAT302
Electrochemical Performance
CV, Cyclic Voltammetry
Metrohm Autolab PGSTAT302
Unknown
XRF, X-Ray Fluorescence
-
SiO2
TiN
Batteries
Lithium-ion
PEALD Film Development
N2 plasma gave films with mostly C and N.
O2 plasma gave non-uniform films without saturation up to 120 seconds.
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