Publication Information

Title: Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor

Type: Journal

Info: Chem. Mater., 2015, 27 (10), pp 3628-3635

Date: 2015-05-05

DOI: http://dx.doi.org/10.1021/acs.chemmater.5b00255

Author Information

Name

Institution

Ghent University

Ghent University

Ghent University

Ghent University

Films

Thermal MnOx using Custom ICP

Deposition Temperature Range = 150-250C

14324-99-3

10028-15-6

Plasma MnOx using Custom ICP

Deposition Temperature = 180C

14324-99-3

1333-74-0

Plasma MnOx using Custom ICP

Deposition Temperature = 180C

14324-99-3

7732-18-5

Deposition Temperature = 180C

14324-99-3

7727-37-9

Deposition Temperature = 180C

14324-99-3

7782-44-7

Plasma MnOx using Custom ICP

Deposition Temperature Range = 140-280C

14324-99-3

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000

Thickness

XRR, X-Ray Reflectivity

Bruker D8 Discover

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Bruker D8 Discover

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

-

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Bruker Dimension Edge

Electrochemical Performance

Galvanostatic Cycling

Metrohm Autolab PGSTAT302

Electrochemical Performance

CV, Cyclic Voltammetry

Metrohm Autolab PGSTAT302

Unknown

XRF, X-Ray Fluorescence

-

Substrates

SiO2

TiN

Keywords

Batteries

Lithium-ion

PEALD Film Development

Notes

N2 plasma gave films with mostly C and N.

O2 plasma gave non-uniform films without saturation up to 120 seconds.

317



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