Publication Information

Title:
Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
Type:
Journal
Info:
Chem. Mater., 2015, 27 (10), pp 3628-3635
Date:
2015-05-05

Author Information

Name Institution
Felix MattelaerGhent University
Philippe M VereeckenGhent University
Jolien DendoovenGhent University
Christophe DetavernierGhent University

Films

Thermal MnOx







Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Electrochemical Performance
Analysis: Galvanostatic Cycling

Characteristic: Electrochemical Performance
Analysis: CV, Cyclic Voltammetry

Characteristic: Unknown
Analysis: XRF, X-Ray Fluorescence

Substrates

SiO2
TiN

Keywords

Batteries
Lithium-ion
PEALD Film Development

Notes

N2 plasma gave films with mostly C and N.
O2 plasma gave non-uniform films without saturation up to 120 seconds.
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