Title: Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
Type: Journal
Info: Chem. Mater., 2015, 27 (10), pp 3628-3635
Date: 2015-05-05
DOI: http://dx.doi.org/10.1021/acs.chemmater.5b00255
Name
Institution
Ghent University
Ghent University
Ghent University
Ghent University
Characteristic
Analysis
Diagnostic
Thickness
Ellipsometry
J.A. Woollam M-2000
Thickness
XRR, X-Ray Reflectivity
Bruker D8 Discover
Crystallinity, Crystal Structure, Grain Size, Atomic Structure
XRD, X-Ray Diffraction
Bruker D8 Discover
Chemical Composition, Impurities
XPS, X-ray Photoelectron Spectroscopy
Unknown
Morphology, Roughness, Topography
AFM, Atomic Force Microscopy
Bruker Dimension Edge
Electrochemical Performance
Galvanostatic Cycling
Metrohm Autolab PGSTAT302
Electrochemical Performance
CV, Cyclic Voltammetry
Metrohm Autolab PGSTAT302
Unknown
XRF, X-Ray Fluorescence
Unknown
SiO2
TiN
Batteries
Lithium-ion
PEALD Film Development
N2 plasma gave films with mostly C and N.
O2 plasma gave non-uniform films without saturation up to 120 seconds.
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