Name

Institution

Felix Mattelaer

Ghent University

Philippe M Vereecken

Ghent University

Jolien Dendooven

Ghent University

Christophe Detavernier

Ghent University

Thermal MnO_x using Custom ICP

Deposition Temperature Range = 150-250C

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III), [Mn(TMHD)₃]

14324-99-3

Where to buy precursor

Ozone, O₃

10028-15-6

Plasma MnO_x using Custom ICP

Deposition Temperature = 180C

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III), [Mn(TMHD)₃]

14324-99-3

Where to buy precursor

Hydrogen, H₂

1333-74-0

Plasma MnO_x using Custom ICP

Deposition Temperature = 180C

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III), [Mn(TMHD)₃]

14324-99-3

Where to buy precursor

Water, H₂O

7732-18-5

Plasma Did Not Work using Custom ICP

Deposition Temperature = 180C

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III), [Mn(TMHD)₃]

14324-99-3

Where to buy precursor

Nitrogen, N₂

7727-37-9

Plasma Did Not Work using Custom ICP

Deposition Temperature = 180C

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III), [Mn(TMHD)₃]

14324-99-3

Where to buy precursor

Oxygen, O₂

7782-44-7

Plasma MnO_x using Custom ICP

Deposition Temperature Range = 140-280C

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III), [Mn(TMHD)₃]

14324-99-3

Where to buy precursor

Ammonia, NH₃

7664-41-7

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000

Thickness

XRR, X-Ray Reflectivity

Bruker D8 Discover

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Bruker D8 Discover

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Bruker Dimension Edge

Electrochemical Performance

Galvanostatic Cycling

Metrohm Autolab PGSTAT302

Electrochemical Performance

CV, Cyclic Voltammetry

Metrohm Autolab PGSTAT302

Unknown

XRF, X-Ray Fluorescence

Unknown

SiO₂

TiN

Batteries

Lithium-ion

PEALD Film Development

N₂ plasma gave films with mostly C and N.

O₂ plasma gave non-uniform films without saturation up to 120 seconds.

317