Publication Information

Title: Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD

Type: Conference Proceedings

Info: ECS J. Solid State Sci. Technol. 2013 volume 2, issue 5, N120-N124

Date: 2013-03-08

DOI: http://dx.doi.org/10.1149/2.016305jss

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Deposition Temperature = 350C

123927-75-3

0-0-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

TEM, Transmission Electron Microscope

FEI Tecnai G2 F30

Thickness

Ellipsometry

J.A. Woollam M-2000D

Chemical Composition, Impurities

Ellipsometry

J.A. Woollam M-2000D

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

NT-MDT Solver P47SPM

Substrates

Silicon

Si3N4

Keywords

High-k Dielectric Thin Films

DRAM capacitor

Notes

595



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