Pentamethyl cyclopentadienyl titanium trimethoxide Ti(CpMe5)(OMe)3, CAS# 123927-75-3

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1EreztechTrimethoxy(pentamethylcyclopentadienyl)titanium(IV) (99.9%-Ti)

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
2Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
3Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
4Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
5Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
6Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
7Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
8Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
9Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
10Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
11Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth