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Publication Information

Title: Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition

Type: Journal

Info: Thin Solid Films 542 (2013) 38 - 44

Date: 2013-06-07

DOI: http://dx.doi.org/10.1016/j.tsf.2013.06.010

Author Information

Name

Institution

King Abdullah University of Science and Technology

King Abdullah University of Science and Technology

King Abdullah University of Science and Technology

King Abdullah University of Science and Technology

King Abdullah University of Science and Technology

King Abdullah University of Science and Technology

King Abdullah University of Science and Technology

Films

Plasma TiO2 using Unknown

Deposition Temperature Range N/A

123927-75-3

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Bruker D8 Discover

Thickness

Ellipsometry

Horiba Jobin Yvon UVISEL

Refractive Index

Ellipsometry

Horiba Jobin Yvon UVISEL

Band Gap

Unknown

Unknown

Unknown

Raman Spectroscopy

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Agilent 5500

Substrates

Silicon

Keywords

Notes

610


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