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Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
Type:
Journal
Info:
Thin Solid Films 542 (2013) 38 - 44
Date:
2013-06-07
Author Information
| Name | Institution |
|---|---|
| Chao Zhao | King Abdullah University of Science and Technology |
| M.N. Hedhili | King Abdullah University of Science and Technology |
| Jingqi Li | King Abdullah University of Science and Technology |
| Qingxiao Wang | King Abdullah University of Science and Technology |
| Yang Yang | King Abdullah University of Science and Technology |
| Long Chen | King Abdullah University of Science and Technology |
| Liang Li | King Abdullah University of Science and Technology |
Films
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Band Gap
Analysis: -
Characteristic: Unknown
Analysis: Raman Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| Silicon |
Notes
| 610 |