Publication Information

Title:
Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
Type:
Journal
Info:
Thin Solid Films 542 (2013) 38 - 44
Date:
2013-06-07

Author Information

Name Institution
Chao ZhaoKing Abdullah University of Science and Technology
M.N. HedhiliKing Abdullah University of Science and Technology
Jingqi LiKing Abdullah University of Science and Technology
Qingxiao WangKing Abdullah University of Science and Technology
Yang YangKing Abdullah University of Science and Technology
Long ChenKing Abdullah University of Science and Technology
Liang LiKing Abdullah University of Science and Technology

Films

Plasma TiO2


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Band Gap
Analysis: -

Characteristic: Unknown
Analysis: Raman Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Silicon

Keywords

Notes

610