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Publication Information

Title: Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors

Type: Journal

Info: Journal of The Electrochemical Society, 158 (2) G34-G38 (2011)

Date: 2010-11-05

DOI: http://dx.doi.org/10.1149/1.3522768

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Plasma SrTiO3 using Custom ICP

Deposition Temperature = 250C

123927-75-3

0-0-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000D

Refractive Index

Ellipsometry

J.A. Woollam M-2000D

Thickness

Ellipsometry

J.A. Woollam M-2000U

Thickness

Ellipsometry

J.A. Woollam M-2000D

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Unknown

Leakage Current

I-V, Current-Voltage Measurements

Unknown

Substrates

Silicon

Keywords

Notes

695


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