Publication Information

Title: Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films

Type: Journal

Info: physica status solidi (a) Volume 211, Issue 2, pages 389--396, 2014

Date: 2013-08-07

DOI: http://dx.doi.org/10.1002/pssa.201330101

Author Information

Name

Institution

Peter-Grünberg Institute

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Peter-Grünberg Institute

Peter-Grünberg Institute

Films

Deposition Temperature = 350C

0-0-0

123927-75-3

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

-

Band Gap

Unknown

-

Leakage Current

Unknown

-

Capacitance

Unknown

-

CET, capacitance equivalent thickness

Unknown

-

Voltage Nonlinearity Factor

Unknown

-

Chemical Composition, Impurities

Ellipsometry

-

Substrates

Pt

Keywords

Notes

612



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