Publication Information

Title:
Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
Type:
Journal
Info:
physica status solidi (a) Volume 211, Issue 2, pages 389--396, 2014
Date:
2013-08-07

Author Information

Name Institution
N. AslamPeter-Grünberg Institute
Valentino LongoEindhoven University of Technology
Wytze KeuningEindhoven University of Technology
Fred RoozeboomEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
R. WaserPeter-Grünberg Institute
Susanne Hoffmann-EifertPeter-Grünberg Institute

Films


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Band Gap
Analysis: -

Characteristic: Leakage Current
Analysis: -

Characteristic: Capacitance
Analysis: -

Characteristic: CET, capacitance equivalent thickness
Analysis: -

Characteristic: Voltage Nonlinearity Factor
Analysis: -

Characteristic: Chemical Composition, Impurities
Analysis: Ellipsometry

Substrates

Pt

Keywords

Notes

612