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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Susanne Hoffmann-Eifert Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Susanne Hoffmann-Eifert returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
2Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
3Forming-free metal-oxide ReRAM by oxygen ion implantation process
4Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
5Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices