About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices

Type:
Conference Proceedings
Info:
2016 46th European Solid-State Device Research Conference (ESSDERC)
Date:
2016-09-12

Author Information

Name Institution
K. FleckRWTH Aachen University
U. BöttgerRWTH Aachen University
R. WaserRWTH Aachen University
N. AslamPeter-Grünberg Institute
Susanne Hoffmann-EifertPeter-Grünberg Institute
S. MenzelPeter-Grünberg Institute

Films


Film/Plasma Properties

Substrates

Notes

931