Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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R. Waser Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by R. Waser returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
2Forming-free metal-oxide ReRAM by oxygen ion implantation process
3Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
4Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices