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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Wytze Keuning Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Wytze Keuning returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
2Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
3Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
4Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
5Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
6Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films