Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 30, 01A131 (2012)
Date:
2011-11-01
Author Information
| Name | Institution |
|---|---|
| Wytze Keuning | Eindhoven University of Technology |
| P. van de Weijer | Philips |
| H. Lifka | Philips |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Mariadriana Creatore | Eindhoven University of Technology |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: -
Characteristic: Barrier Characteristics
Analysis: Calcium Test
Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test
Characteristic: Barrier Characteristics
Analysis: OLED Illumination
Substrates
| SiO2 |
| OLED |
Notes
| 633 |