Search 1555 plasma ALD publications by:
Search 1555 plasma ALD publications by:
Publication Information
Title:
Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
Type:
Journal
Info:
The Journal of Chemical Physics 146, 052818 (2017)
Date:
2016-11-29
Author Information
Name | Institution |
---|---|
Ivo Johannes Maria Erkens | Eindhoven University of Technology |
Marcel A. Verheijen | Eindhoven University of Technology |
Harm C. M. Knoops | Eindhoven University of Technology |
Wytze Keuning | Eindhoven University of Technology |
Fred Roozeboom | Eindhoven University of Technology |
Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Plasma Pt
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope
Substrates
SiO2 |
Keywords
Notes
897 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |