Publication Information

Title:
Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
Type:
Journal
Info:
The Journal of Chemical Physics 146, 052818 (2017)
Date:
2016-11-29

Author Information

Name Institution
Ivo Johannes Maria ErkensEindhoven University of Technology
Marcel A. VerheijenEindhoven University of Technology
Harm C. M. KnoopsEindhoven University of Technology
Wytze KeuningEindhoven University of Technology
Fred RoozeboomEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope

Substrates

SiO2

Keywords

Notes

897