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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
Gallium nitride thin films by microwave plasma-assisted ALD
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Encapsulation method for atom probe tomography analysis of nanoparticles
Type:
Journal
Info:
Ultramicroscopy, Available online 24 February 2015
Date:
2015-04-28
Author Information
| Name | Institution |
|---|---|
| D.J. Larson | CAMECA Instruments Inc. |
| A.D. Giddings | CAMECA Instruments Inc. |
| Y. Wu | Eindhoven University of Technology |
| Marcel A. Verheijen | Eindhoven University of Technology |
| T.J. Prosa | CAMECA Instruments Inc. |
| Fred Roozeboom | Eindhoven University of Technology |
| K.P. Rice | CAMECA Instruments Inc. |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| B.P. Geiser | CAMECA Instruments Inc. |
| T.F. Kelly | CAMECA Instruments Inc. |
Films
Thermal Al:ZnO
Film/Plasma Properties
Characteristic: Images
Analysis: APT, Atom Probe Tomography
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Substrates
Notes
| 329 |