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196 Films Compositions
265 Precursors and Plasma Gases
76 Deposition Hardwares
242 Film and Plasma Characteristics
84 Theses
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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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Encapsulation method for atom probe tomography analysis of nanoparticles
Type:
Journal
Info:
Ultramicroscopy, Available online 24 February 2015
Date:
2015-04-28
Author Information
| Name | Institution |
|---|---|
| D.J. Larson | CAMECA Instruments Inc. |
| A.D. Giddings | CAMECA Instruments Inc. |
| Y. Wu | Eindhoven University of Technology |
| Marcel A. Verheijen | Eindhoven University of Technology |
| T.J. Prosa | CAMECA Instruments Inc. |
| Fred Roozeboom | Eindhoven University of Technology |
| K.P. Rice | CAMECA Instruments Inc. |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| B.P. Geiser | CAMECA Instruments Inc. |
| T.F. Kelly | CAMECA Instruments Inc. |
Films
Thermal Al:ZnO
Film/Plasma Properties
Characteristic: Images
Analysis: APT, Atom Probe Tomography
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Substrates
Keywords
Notes
| 329 |