Publication Information

Title:
Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
Type:
Journal
Info:
Chem. Mater. 2017, 29, 921-925
Date:
2017-01-23

Author Information

Name Institution
Alfredo MameliEindhoven University of Technology
Yinghuan KuangEindhoven University of Technology
Morteza AghaeeLappeenranta University of Technology
Chaitanya Krishna AndeEindhoven University of Technology
Bora KarasuluEindhoven University of Technology
Mariadriana CreatoreEindhoven University of Technology
Adriaan J. M. MackusEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Fred RoozeboomEindhoven University of Technology

Films

Other In2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Area Selectivity
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Area Selectivity
Analysis: I-V, Current-Voltage Measurements

Substrates

Si-H
SiO2

Keywords

Area Selective

Notes

1190