Publication Information

Title: Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation

Type: Journal

Info: Chem. Mater. 2017, 29, 921-925

Date: 2017-01-23

DOI: http://dx.doi.org/10.1021/acs.chemmater.6b04469

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Lappeenranta University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Deposition Temperature = 100C

34822-89-4

7782-44-7

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000D

Area Selectivity

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Area Selectivity

I-V, Current-Voltage Measurements

-

Substrates

Si-H

SiO2

Keywords

Area Selective

Notes

1190



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