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Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
Type:
Journal
Info:
Chem. Mater. 2017, 29, 921-925
Date:
2017-01-23
Author Information
| Name | Institution |
|---|---|
| Alfredo Mameli | Eindhoven University of Technology |
| Yinghuan Kuang | Eindhoven University of Technology |
| Morteza Aghaee | Lappeenranta University of Technology |
| Chaitanya Krishna Ande | Eindhoven University of Technology |
| Bora Karasulu | Eindhoven University of Technology |
| Mariadriana Creatore | Eindhoven University of Technology |
| Adriaan J. M. Mackus | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Fred Roozeboom | Eindhoven University of Technology |
Films
Other In2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Area Selectivity
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Area Selectivity
Analysis: I-V, Current-Voltage Measurements
Substrates
| Si-H |
| SiO2 |
Notes
| 1190 |