Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
Type:
Conference Proceedings
Info:
Proceedings of the 25th European Photovoltaic Solar Energy Conference
Date:
2010-09-06
Author Information
| Name | Institution |
|---|---|
| Jan Schmidt | Institute for Solar Energy Research Hamelin (ISFH) |
| Florian Werner | Institute for Solar Energy Research Hamelin (ISFH) |
| Boris Veith | Institute for Solar Energy Research Hamelin (ISFH) |
| D Zielke | Institute for Solar Energy Research Hamelin (ISFH) |
| Robert Bock | Institute for Solar Energy Research Hamelin (ISFH) |
| Veronica Tiba | SoLayTec |
| Paul Poodt | TNO |
| Fred Roozeboom | TNO |
| Andrew Li | The Australian National University |
| Andres Cuevas | The Australian National University |
| Rolf Brendel | Institute for Solar Energy Research Hamelin (ISFH) |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Lifetime
Analysis: Photoconductance
Characteristic: Surface Recombination Velocity
Analysis: Photoconductance
Characteristic: Open Circuit Voltage
Analysis: -
Characteristic: Short Circuit Current
Analysis: -
Characteristic: Fill Factor
Analysis: -
Characteristic: Efficiency
Analysis: -
Substrates
| Silicon |
Notes
| Compares plasma film with conventional thermal and spatial thermal ALD. |
| 708 |