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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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D Zielke Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by D Zielke returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
2Improved understanding of recombination at the Si/Al2O3 interface
3Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells