Publication Information

Title:
Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
Type:
Conference Proceedings
Info:
2010 35th IEEE Photovoltaic Specialists Conference (PVSC)
Date:
2010-06-20

Author Information

Name Institution
Jan SchmidtInstitute for Solar Energy Research Hamelin (ISFH)
Boris VeithInstitute for Solar Energy Research Hamelin (ISFH)
Florian WernerInstitute for Solar Energy Research Hamelin (ISFH)
D ZielkeInstitute for Solar Energy Research Hamelin (ISFH)
Rolf BrendelInstitute for Solar Energy Research Hamelin (ISFH)

Films

Thermal Al2O3


Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Passivation
Analysis: Photoconductance

Characteristic: Minority Carrier Lifetime
Analysis: Photoconductance

Characteristic: Surface Recombination Velocity
Analysis: Photoconductance

Characteristic: Open Circuit Voltage
Analysis: Custom

Characteristic: Short Circuit Current
Analysis: Custom

Characteristic: Fill Factor
Analysis: Custom

Characteristic: Efficiency
Analysis: Custom

Substrates

Silicon

Keywords

Passivation

Notes

714