Publication Information

Title:
Patterned deposition by plasma enhanced spatial atomic layer deposition
Type:
Journal
Info:
physica status solidi (RRL) - Rapid Research Letters Volume 5, Issue 4, pages 165--167, 2011
Date:
2011-03-29

Author Information

Name Institution
Paul PoodtTNO
Bas KniknieTNO
Annalisa BrancaTNO
Hans WinandsTNO
Fred RoozeboomTNO

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Substrates

Si(100)

Keywords

Notes

692