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Publication Information

Title: Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition

Type: Journal

Info: Applied Surface Science, Volume 330, 1 March 2015, Pages 476-486

Date: 2014-12-31

DOI: http://dx.doi.org/10.1016/j.apsusc.2014.12.197

Author Information

Name

Institution

Eindhoven University of Technology

Films

Deposition Temperature Range N/A

546-68-9

7782-44-7

7727-37-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Thickness

Ellipsometry

J.A. Woollam M-2000U

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

FEI Quanta 3D FEG

Morphology, Roughness, Topography

TEM, Transmission Electron Microscope

JEOL JEM ARM 200

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Bruker D4 Endeavor

Substrates

Keywords

Photocatalyst

Doping

Notes

Oxford Instruments FlexAL PEALD TiON for photocatalysis application.

270

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