Publication Information

Title:
Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
Type:
Journal
Info:
Applied Surface Science, Volume 330, 1 March 2015, Pages 476-486
Date:
2014-12-31

Author Information

Name Institution
Yi ZhangEindhoven University of Technology

Films

Plasma TiON


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Substrates

Keywords

Photocatalyst
Doping

Notes

Oxford Instruments FlexAL PEALD TiON for photocatalysis application.
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