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Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
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Publication Information
Title:
Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
Type:
Journal
Info:
Nano Lett., 2013, 13 (5), pp 1983-1990
Date:
2013-03-11
Author Information
| Name | Institution |
|---|---|
| Wei Liu | University of California - Santa Barbara (UCSB) |
| Jiahao Kang | University of California - Santa Barbara (UCSB) |
| Deblina Sarkar | University of California - Santa Barbara (UCSB) |
| Yasin Khatami | University of California - Santa Barbara (UCSB) |
| Debdeep Jena | University of Notre Dame |
| Kaustav Banerjee | University of California - Santa Barbara (UCSB) |
Films
Plasma Al2O3
Film/Plasma Properties
Substrates
| WSe2 |
Keywords
Notes
| 576 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |