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Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
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Publication Information
Title:
Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
Type:
Journal
Info:
J. Am. Chem. Soc. 2014, 136, 6191-6194
Date:
2014-04-10
Author Information
| Name | Institution |
|---|---|
| Jinhui Yang | Lawrence Berkeley National Laboratory |
Films
Plasma CoOx
Film/Plasma Properties
Substrates
Keywords
Notes
| 209 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |