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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
Type:
Journal
Info:
J. Am. Chem. Soc. 2014, 136, 6191-6194
Date:
2014-04-10
Author Information
| Name | Institution |
|---|---|
| Jinhui Yang | Lawrence Berkeley National Laboratory |
Films
Plasma CoOx
Film/Plasma Properties
Substrates
Keywords
Notes
| 209 |