Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces

Type:
Journal
Info:
J. Am. Chem. Soc. 2014, 136, 6191-6194
Date:
2014-04-10
DOI:
http://dx.doi.org/10.1021/ja501513t

Author Information

Name Institution
Jinhui YangLawrence Berkeley National Laboratory

Films

Plasma CoOx

Hardware used: Oxford Instruments FlexAL
cobaltacene, bis(cyclopentadienyl)cobalt, Cp2Co
CAS#: 1277-43-6
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 300C

Film/Plasma Properties

Substrates

Notes

209