Publication Information

Title:
Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
Type:
Journal
Info:
J. Vac. Sci. Technol. B 32(3), May/Jun 2014
Date:
2013-07-15

Author Information

Name Institution
Nelson Y. GarcesU.S. Naval Research Laboratory

Films

Plasma Al2O3



Film/Plasma Properties

Substrates

Keywords

Notes

195