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Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
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Publication Information
Title:
Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
Type:
Journal
Info:
J. Vac. Sci. Technol. B 32(3), May/Jun 2014
Date:
2013-07-15
Author Information
| Name | Institution |
|---|---|
| Nelson Y. Garces | U.S. Naval Research Laboratory |
Films
Plasma Al2O3
Plasma TiO2
Film/Plasma Properties
Substrates
Keywords
Notes
| 195 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |