Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions

Type:
Journal
Info:
J. Phys. Chem. C, 2020, 124 (9), pp 5495-5505
Date:
2020-02-10
DOI:
http://dx.doi.org/10.1021/acs.jpcc.0c00301

Author Information

Name Institution
Norah HornsveldEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Mariadriana CreatoreEindhoven University of Technology

Films

Plasma AlPxOy

Hardware used: Oxford Instruments FlexAL
TMA, trimethyl aluminum, AlMe3
CAS#: 75-24-1
Where to buy precursor
Trimethyl phosphate, TMP, (MeO)3PO
CAS#: 512-56-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 25-300C

Plasma POx

Hardware used: Oxford Instruments FlexAL
Trimethyl phosphate, TMP, (MeO)3PO
CAS#: 512-56-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 150-300C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000F

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000F

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000D

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000D

Characteristic: Uniformity
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000D

Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Diagnostic: -

Characteristic: Density
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: -

Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific K-Alpha+

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Philips X'Pert MPD Diffactometer

Characteristic: Surface Reactions
Analysis: QMS, Quadrupole Mass Spectrometer
Diagnostic: Pfeiffer QMS

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Diagnostic: Pfeiffer QMS

Substrates

Si with native oxide
InP

Keywords

Reaction Mechanism

Notes

POx process does not show saturative behavior and reacts with air upon exposure.
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