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Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
Innovative remote plasma source for atomic layer deposition for GaN devices
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
Type:
Journal
Info:
Sol. RRL 2017, 1700159
Date:
2017-11-03
Author Information
| Name | Institution |
|---|---|
| Dennis Bredemeier | Institute for Solar Energy Research Hamelin (ISFH) |
| Dominic C. Walter | Institute for Solar Energy Research Hamelin (ISFH) |
| Jan Schmidt | Institute for Solar Energy Research Hamelin (ISFH) |
Films
Plasma Al2O3
Film/Plasma Properties
Substrates
Keywords
| Solar |
| Passivation |
Notes
| 1123 |