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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
Gallium nitride thin films by microwave plasma-assisted ALD
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
Type:
Journal
Info:
Sol. RRL 2017, 1700159
Date:
2017-11-03
Author Information
| Name | Institution |
|---|---|
| Dennis Bredemeier | Institute for Solar Energy Research Hamelin (ISFH) |
| Dominic C. Walter | Institute for Solar Energy Research Hamelin (ISFH) |
| Jan Schmidt | Institute for Solar Energy Research Hamelin (ISFH) |
Films
Plasma Al2O3
Film/Plasma Properties
Substrates
Notes
| 1123 |