Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration

Type:
Journal
Info:
Sol. RRL 2017, 1700159
Date:
2017-11-03
DOI:
http://dx.doi.org/10.1002/solr.201700159

Author Information

Name Institution
Dennis BredemeierInstitute for Solar Energy Research Hamelin (ISFH)
Dominic C. WalterInstitute for Solar Energy Research Hamelin (ISFH)
Jan SchmidtInstitute for Solar Energy Research Hamelin (ISFH)

Films

Plasma Al2O3

Hardware used: Oxford Instruments FlexAL
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

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