Atomic Layer Deposition of the Conductive Delafossite PtCoO2

Type:
Journal
Info:
Adv. Mater. Interfaces 2022, 9, 2200013
Date:
2022-01-29

Author Information

Name Institution
Dirk J. HagenMax Planck Institute of Microstructure Physics
Jiho YoonMax Planck Institute of Microstructure Physics
Haojie ZhangMax Planck Institute of Microstructure Physics
Bodo KalkofenMax Planck Institute of Microstructure Physics
Mindaugas SilinskasMax Planck Institute of Microstructure Physics
Felix BörrnertMax Planck Institute of Microstructure Physics
Hyeon HanMax Planck Institute of Microstructure Physics
Stuart S. P. ParkinMax Planck Institute of Microstructure Physics

Films


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope

Characteristic: Resistivity, Sheet Resistance
Analysis: van der Pauw sheet resistance

Characteristic: Electron Density, ne
Analysis: Hall Measurements

Characteristic: Magnetic Properties
Analysis: -

Substrates

Silicon
Sapphire
YIG, Y3Fe5O12

Notes

1681