Plasma-enhanced atomic layer deposition of BaTiO3
Type:
Journal
Info:
Scripta Materialia, Volume 111, Pages 106 - 109
Date:
2015-08-23
Author Information
| Name | Institution |
|---|---|
| Peter Schindler | Stanford University |
| Youngjun Kim | Stanford University |
| Dickson Thian | Stanford University |
| Jihwan An | Stanford University |
| Fritz B. Prinz | Stanford University |
Films
Plasma BaTiO3
Plasma BaO
Plasma TiO2
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: EOT, Equivalent Oxide Thickness
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: EOT, Equivalent Oxide Thickness
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
| Silicon |
Notes
| 517 |