Publication Information

Title: Plasma-enhanced atomic layer deposition of BaTiO3

Type: Journal

Info: Scripta Materialia, Volume 111, Pages 106 - 109

Date: 2015-08-23

DOI: http://dx.doi.org/10.1016/j.scriptamat.2015.08.026

Author Information

Name

Institution

Stanford University

Stanford University

Stanford University

Stanford University

Stanford University

Films

Deposition Temperature Range N/A

0-0-0

546-68-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

Unknown

-

Morphology, Roughness, Topography

Unknown

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Unknown

-

EOT, Equivalent Oxide Thickness

Unknown

-

Leakage Current

Unknown

-

Substrates

Keywords

High-k Dielectric Thin Films

Notes

517



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