Publication Information

Title: Plasma-enhanced atomic layer deposition of BaTiO3

Type: Journal

Info: Scripta Materialia, Volume 111, Pages 106 - 109

Date: 2015-08-23

DOI: http://dx.doi.org/10.1016/j.scriptamat.2015.08.026

Author Information

Name

Institution

Stanford University

Stanford University

Stanford University

Stanford University

Stanford University

Films

Deposition Temperature Range N/A

0-0-0

546-68-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

Unknown

Unknown

Morphology, Roughness, Topography

Unknown

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Unknown

Unknown

EOT, Equivalent Oxide Thickness

Unknown

Unknown

Leakage Current

Unknown

Unknown

Substrates

Keywords

High-k Dielectric Thin Films

Notes

517



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