Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy Bis(triisopropyl cyclopentadienyl) barium, Ba(iPr3Cp)2 CAS# 147658-83-1

Bis(triisopropyl cyclopentadienyl) barium, Ba(iPr3Cp)2 CAS# 147658-83-1 is available from the following source(s):

NumberVendorRegionLink
1Ereztech🇺🇸Bis(1,2,4-tri-isopropylcyclopentadienyl)barium*0.5DME
2DOCK/CHEMICALS🇩🇪Bis(triisopropylcyclopentadienyl)barium

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