Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy

Type:
Journal
Info:
J. Am. Chem. Soc., 2017, 139 (26), pp 8960-8970
Date:
2017-06-09

Author Information

Name Institution
Marco FavaroLawrence Berkeley National Laboratory
Jinhui YangLawrence Berkeley National Laboratory
Silvia NappiniIOM Laboratorio Nazionale TASC, CNR
Elena MagnanoIOM Laboratorio Nazionale TASC, CNR
Francesca M. TomaLawrence Berkeley National Laboratory
Ethan J. CrumlinLawrence Berkeley National Laboratory
Junko YanoLawrence Berkeley National Laboratory
Ian D. SharpLawrence Berkeley National Laboratory

Films

Plasma CoOx


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Electrochemical Performance
Analysis: Three Electrode

Substrates

Silicon

Notes

1043