Publication Information

Title: Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy

Type: Journal

Info: J. Am. Chem. Soc., 2017, 139 (26), pp 8960–8970

Date: 2017-06-09

DOI: http://dx.doi.org/10.1021/jacs.7b03211

Author Information

Name

Institution

Lawrence Berkeley National Laboratory

Lawrence Berkeley National Laboratory

IOM Laboratorio Nazionale TASC, CNR

IOM Laboratorio Nazionale TASC, CNR

Lawrence Berkeley National Laboratory

Lawrence Berkeley National Laboratory

Lawrence Berkeley National Laboratory

Lawrence Berkeley National Laboratory

Films

Deposition Temperature Range = 100-300C

1277-43-6

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Horiba Jobin Yvon UVISEL

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

-

Bonding States

XPS, X-ray Photoelectron Spectroscopy

-

Electrochemical Performance

Three Electrode

-

Substrates

Silicon

Keywords

Photoelectrochemical (PEC) water splitting

Catalysts

Notes

1043



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