Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Francesca M. Toma Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Francesca M. Toma returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
2Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
3High Performance CoOx/Si Photoanodes: Accessing Structural Disorder for Improved Catalytic Activity via Atomic Layer Deposition
4Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
5Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation