High Performance CoOx/Si Photoanodes: Accessing Structural Disorder for Improved Catalytic Activity via Atomic Layer Deposition

Type:
Conference Proceedings
Info:
2015 MRS Spring Meeting & Exhibit
Date:
2015-04-06
DOI:
http://www.mrs.org/spring-2015-program-j/?ref=driverlayer.com

Author Information

Name Institution
Jinhui YangLawrence Berkeley National Laboratory
Francesca M. TomaLawrence Berkeley National Laboratory
Chenhui ZhuLawrence Berkeley National Laboratory
Adam M. SchwartzbergLawrence Berkeley National Laboratory
Ian D. SharpLawrence Berkeley National Laboratory

Films

Plasma CoOx

Hardware used: Unknown
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Photoelectrochemical (PEC) Activity
Analysis: -
Diagnostic: -

Characteristic: Photocurrent
Analysis: -
Diagnostic: -

Substrates

Si(100)

Notes

486