About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

High Performance CoO_x/Si Photoanodes: Accessing Structural Disorder for Improved Catalytic Activity via Atomic Layer Deposition

Type:

Conference Proceedings

Info:

2015 MRS Spring Meeting & Exhibit

Date:

2015-04-06

DOI:

http://www.mrs.org/spring-2015-program-j/?ref=driverlayer.com

Author Information

Name	Institution
Jinhui Yang	Lawrence Berkeley National Laboratory
Francesca M. Toma	Lawrence Berkeley National Laboratory
Chenhui Zhu	Lawrence Berkeley National Laboratory
Adam M. Schwartzberg	Lawrence Berkeley National Laboratory
Ian D. Sharp	Lawrence Berkeley National Laboratory

Films

Plasma CoO_x

Hardware used: Unknown

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Photoelectrochemical (PEC) Activity

Analysis: -

Diagnostic: -

Characteristic: Photocurrent