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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
Gallium nitride thin films by microwave plasma-assisted ALD
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
Type:
Conference Proceedings
Info:
ECS Meeting Abstracts
Date:
2015-05-27
Author Information
| Name | Institution |
|---|---|
| Jinhui Yang | Lawrence Berkeley National Laboratory |
| Jason K. Cooper | Lawrence Berkeley National Laboratory |
| Francesca M. Toma | Lawrence Berkeley National Laboratory |
| Ian D. Sharp | Lawrence Berkeley National Laboratory |
Films
Plasma CoOx
Film/Plasma Properties
Characteristic: Unknown
Analysis: X-ray Absorption Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Unknown
Analysis: GIWAXS, Grazing Incidence Wide Angle X-ray Scattering
Characteristic: Unknown
Analysis: TEM, Transmission Electron Microscope
Substrates
| Silicon |
Notes
| 494 |