Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation

Type:
Conference Proceedings
Info:
ECS Meeting Abstracts
Date:
2015-05-27
DOI:
http://ma.ecsdl.org/content/MA2015-01/19/1305.short

Author Information

Name Institution
Jinhui YangLawrence Berkeley National Laboratory
Jason K. CooperLawrence Berkeley National Laboratory
Francesca M. TomaLawrence Berkeley National Laboratory
Ian D. SharpLawrence Berkeley National Laboratory

Films

Plasma CoOx

Hardware used: Unknown
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Unknown
Analysis: X-ray Absorption Spectroscopy
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Unknown
Analysis: GIWAXS, Grazing Incidence Wide Angle X-ray Scattering
Diagnostic: -

Characteristic: Unknown
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Substrates

Silicon

Notes

494