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Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
Innovative remote plasma source for atomic layer deposition for GaN devices
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
Type:
Conference Proceedings
Info:
ECS Meeting Abstracts
Date:
2015-05-27
Author Information
| Name | Institution |
|---|---|
| Jinhui Yang | Lawrence Berkeley National Laboratory |
| Jason K. Cooper | Lawrence Berkeley National Laboratory |
| Francesca M. Toma | Lawrence Berkeley National Laboratory |
| Ian D. Sharp | Lawrence Berkeley National Laboratory |
Films
Plasma CoOx
Film/Plasma Properties
Characteristic: Unknown
Analysis: X-ray Absorption Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Unknown
Analysis: GIWAXS, Grazing Incidence Wide Angle X-ray Scattering
Characteristic: Unknown
Analysis: TEM, Transmission Electron Microscope
Substrates
| Silicon |
Keywords
| Solar |
| Photoelectrochemical (PEC) water splitting |
Notes
| 494 |