Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses

Type:
Journal
Info:
Optics Letters Vol. 41, Issue 21, pp. 5090--5093 (2016)
Date:
2016-10-07
DOI:
http://dx.doi.org/10.1364/OL.41.005090

Author Information

Name Institution
Riccardo MincigrucciElettra Sincrotrone Trieste
Alessia MatruglioIOM Laboratorio Nazionale TASC, CNR
Andrea CalviUniversità  degli Studi di Trieste
Laura FogliaElettra Sincrotrone Trieste
Emiliano PrincipiElettra Sincrotrone Trieste
Alberto SimoncigElettra Sincrotrone Trieste
Filippo BencivengaElettra Sincrotrone Trieste
Stefano DallortoMolecular Foundry
Alessandro GessiniElettra Sincrotrone Trieste
Gabor KurdiElettra Sincrotrone Trieste
Deirdre L. OlynickMolecular Foundry
Scott DhueyMolecular Foundry
Rudi SergoElettra Sincrotrone Trieste
Marco LazzarinoIOM Laboratorio Nazionale TASC, CNR
Claudio MasciovecchioElettra Sincrotrone Trieste
Simone Dal ZilioIOM Laboratorio Nazionale TASC, CNR

Films

Plasma Al2O3

Hardware used: Oxford Instruments FlexAL
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 40C

Film/Plasma Properties

Substrates

SiO2

Notes

974