Publication Information

Title:
Densification of Thin Aluminum Oxide Films by Thermal Treatments
Type:
Journal
Info:
Materials Sciences and Applications, 2014, 5, 628-638
Date:
2014-06-04

Author Information

Name Institution
V. CimallaFraunhofer Institute for Applied Solid State Physics
M. BaeumlerFraunhofer Institute for Applied Solid State Physics
Lutz KirsteFraunhofer Institute for Applied Solid State Physics
M. PrescherFraunhofer Institute for Applied Solid State Physics
B. ChristianFraunhofer Institute for Applied Solid State Physics
T. PassowFraunhofer Institute for Applied Solid State Physics
Fouad BenkhelifaFraunhofer Institute for Applied Solid State Physics
Frank BernhardtFraunhofer Institute for Applied Solid State Physics
G. EichapfelIlmenau University of Technology
M. HimmerlichIlmenau University of Technology
S. KrischokIlmenau University of Technology
J. PezoldtIlmenau University of Technology

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Unknown
Analysis: FTIR Spectroscopic Ellipsometry

Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements

Substrates

4H n-SiC(0001)

Keywords

Notes

AlOx samples annealed in N2 for 1 hour at 500 - 1025C.
145