Publication Information

Title: Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers

Type: Journal

Info: ACS Appl. Mater. Interfaces, 2015, 7 (40), pp 22525-22532

Date: 2015-09-22

DOI: http://dx.doi.org/10.1021/acsami.5b06801

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Deposition Temperature Range = 80-200C

186598-40-3

7727-37-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000F

Refractive Index

Ellipsometry

J.A. Woollam M-2000F

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Chemical Composition, Impurities

FTIR, Fourier Transform InfraRed spectroscopy

Bruker Optics Tensor 27

Porosity

Ellipsometric Porosimetry (EP)

Unknown

Barrier Characteristics

Calcium Test

Unknown

Substrates

Si with native oxide

Keywords

Notes

383



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