Publication Information

Title:
Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2015, 7 (40), pp 22525-22532
Date:
2015-09-22

Author Information

Name Institution
Anne-Marije AndringaEindhoven University of Technology
Alberto PerrottaEindhoven University of Technology
Koen de PeuterEindhoven University of Technology
Harm C. M. KnoopsEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Mariadriana CreatoreEindhoven University of Technology

Films

Plasma SiNx


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Porosity
Analysis: Ellipsometric Porosimetry (EP)

Characteristic: Barrier Characteristics
Analysis: Calcium Test

Substrates

Si with native oxide

Keywords

Notes

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