Publication Information

Title: Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene

Type: Journal

Info: Journal of Physics: Conference Series 917 (2017) 032039

Date: 2017-11-01

DOI: https://doi.org/10.1088/1742-6596/917/3/032039

Author Information

Name

Institution

Moscow Institute of Physics and Technology

Moscow Institute of Physics and Technology

Russian Academy of Sciences

Russian Academy of Sciences

Moscow Institute of Physics and Technology

Films

Deposition Temperature = 300C

75-24-1

7732-18-5

Deposition Temperature = 300C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000X

Substrate Temperature

Ellipsometry

J.A. Woollam M-2000X

Damage, Defects

Raman Spectroscopy

Bruker Senterra Raman microscope

Substrates

Graphene

Keywords

Plasma vs Thermal Comparison

Notes

1073



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