Publication Information

Title:
Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
Type:
Journal
Info:
Journal of Physics: Conference Series 917 (2017) 032039
Date:
2017-11-01

Author Information

Name Institution
Iosif E. ClementeMoscow Institute of Physics and Technology
Andrey V. MiakonkikhMoscow Institute of Physics and Technology
O KononenkoRussian Academy of Sciences
V MatveevRussian Academy of Sciences
Konstantin V. RudenkoMoscow Institute of Physics and Technology

Films

Thermal Al2O3


Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Substrate Temperature
Analysis: Ellipsometry

Characteristic: Damage, Defects
Analysis: Raman Spectroscopy

Substrates

Graphene

Keywords

Plasma vs Thermal Comparison

Notes

1073