Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
Type:
Journal
Info:
Nanoscale, 2021, 13, 10092
Date:
2021-05-25
Author Information
| Name | Institution |
|---|---|
| Saurabh Karwal | Eindhoven University of Technology |
| Bora Karasulu | University of Warwick |
| Harm C. M. Knoops | Eindhoven University of Technology |
| Vincent Vandalon | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Mariadriana Creatore | Eindhoven University of Technology |
Films
Plasma HfNx
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Substrates
| SiO2 |
Notes
| 1587 |