Publication Information

Title:
In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
Type:
Journal
Info:
2016 J. Phys. D: Appl. Phys. 49 115504
Date:
2015-12-14

Author Information

Name Institution
NoƩmi LeickEindhoven University of Technology
J. W. WeberEindhoven University of Technology
Adriaan J. M. MackusEindhoven University of Technology
Matthieu J. WeberEindhoven University of Technology
Mauritius C. M. (Richard) van de SandenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films



Thermal Ru


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Resistivity, Sheet Resistance
Analysis: Ellipsometry

Characteristic: Dielectric Function
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Resistivity, Sheet Resistance
Analysis: FTIR reflectance

Substrates

Silicon
Al2O3

Keywords

Notes

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