Publication Information

Title: In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd

Type: Journal

Info: 2016 J. Phys. D: Appl. Phys. 49 115504

Date: 2015-12-14

DOI: http://dx.doi.org/10.1088/0022-3727/49/11/115504

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Plasma Pt using Custom

Deposition Temperature = 100C

94442-22-5

7782-44-7

Plasma Pd using Custom

Deposition Temperature = 300C

64916-48-9

1333-74-0

Deposition Temperature = 400C

0-0-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Resistivity, Sheet Resistance

Ellipsometry

Unknown

Dielectric Function

Ellipsometry

Unknown

Substrates

Silicon

Al2O3

Keywords

Notes

529



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